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PVD for microelectronics : sputter deposition applied to semiconductor manufacturing
Record Type:
Electronic resources : monographic
Title Information:
sputter deposition applied to semiconductor manufacturing
Author:
PowellRonald A.,
Secondary Intellectual Responsibility:
RossnagelStephen M.,
Place of Publication:
San Diego
Published:
Academic Press;
Year of Publication:
c1999.
Description:
xiii, 419 p.ill. : 24 cm.;
Series:
Thin films
Subject:
Thin film devices - Design and construction. -
Subject:
Vapor-plating. -
Subject:
Thin films. -
Online resource:
http://www.sciencedirect.com/science/book/9780125330268
ISBN:
9780125330268electronic bk.
ISBN:
9780125330268
PVD for microelectronics : sputter deposition applied to semiconductor manufacturing
Powell, Ronald A.
PVD for microelectronics
: sputter deposition applied to semiconductor manufacturing / Ronald A. Powell, Stephen M. Rossnagel. - San Diego : Academic Press, c1999.. - xiii, 419 p. ; ill. ; 24 cm.. - (Thin films ; v. 26).
Includes bibliographical references and indexes..
ISBN 9780125330268ISBN 9780125330268
Thin film devicesVapor-plating.Thin films. -- Design and construction.
Rossnagel, Stephen M.
PVD for microelectronics : sputter deposition applied to semiconductor manufacturing
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http://www.sciencedirect.com/science/book/9780125330268
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